We have four UHV apparatuses for the surface analysis

1. Apparatus for 3D structure analysis of surfaces and thin films.
• Weissenberg RHEED
• Auger electron spectroscopy
• In-situ sample preparation, such as annealing, cooling, deposition, etc.
2. Apparatus for surface spin arrangement.
• Low energy electron diffraction with an image intensifier
• Spin-polarized electron gun using NEA GaAs cathode
• Correlated thermal-diffuse scattering (CTDS) with spin-polarized electron
• In-situ sample preparation, such as annealing, cooling, deposition, etc.
3. Apparatus for ultrafast dynamics of surface structure
• Streak-camera reflection high-energy electron diffraction
• In-situ sample preparation, such as annealing, cooling, deposition, etc.
4. Apparatus for 2D mapping of surfaces.
• Photoelectron emission microscopy
• Photoemission spectroscopy of micro-area
• In-situ sample preparation, such as annealing, cooling, deposition, etc.