Our apparatuses for surface analysis

We have four UHV apparatuses for the surface analysis

  1. Apparatus for 3D structure analysis of surfaces and thin films.
    • Weissenberg RHEED
    • Auger electron spectroscopy
    • In-situ sample preparation, such as annealing, cooling, deposition, etc.
  2. Apparatus for surface spin arrangement.
    • Low energy electron diffraction with an image intensifier
    • Spin-polarized electron gun using NEA GaAs cathode
    • Correlated thermal-diffuse scattering (CTDS) with spin-polarized electron
    • In-situ sample preparation, such as annealing, cooling, deposition, etc.
  3. Apparatus for ultrafast dynamics of surface structure
    • Streak-camera reflection high-energy electron diffraction
    • In-situ sample preparation, such as annealing, cooling, deposition, etc.
  4. Apparatus for 2D mapping of surfaces.
    • Photoelectron emission microscopy
    • Photoemission spectroscopy of micro-area
    • In-situ sample preparation, such as annealing, cooling, deposition, etc.

 

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